Interface Roughness Scattering

Interface Roughness Scattering is a scattering mechanism in semiconductor heterostructures where carrier transport is perturbed by structural imperfections at the interfaces between different material layers, arising from atomic-scale deviations in the idealized boundary morphology that modulate the confinement potential in quantum wells.

282

Publications

14.2K

Citations

997

Authors

314

Institutions

Publications per year

2017–2026

31

Authors

997

  1. NB
    N. Balkan

    University of Essex, United Kingdom

    6 publications · 368 citations

    6

    h-index

  2. GJ
    Gail J. Brown

    Wright-Patterson Air Force Base, United States

    6 publications · 141 citations

    6

    h-index

  3. HS
    H. Sakaki

    The University of Tokyo, Japan

    6 publications · 909 citations

    6

    h-index

  4. AG
    A. Gold

    Université Toulouse III - Paul Sabatier, France

    6 publications · 595 citations

    6

    h-index

  5. FS
    Frank Szmulowicz

    Wright-Patterson Air Force Base, United States

    5 publications · 124 citations

    5

    h-index

1–5 of 997

Venues

  1. Applied Physics Letters

    59 publications · 3.2K citations

    27

    h-index

  2. Journal of Applied Physics

    47 publications · 2.9K citations

    26

    h-index

  3. Physical review. B, Condensed matter

    PRB · 26 publications · 1.2K citations

    19

    h-index

  4. Semiconductor Science and Technology

    15 publications · 678 citations

    15

    h-index

  5. IEEE Transactions on Electron Devices

    12 publications · 2K citations

    12

    h-index

1–5