Concepedia

Interconnect Reliability

Interconnect Reliability is a semiconductor reliability attribute that characterizes the ability of interconnect structures to maintain electrical and mechanical integrity under operational and environmental stresses over time.

947

Publications

35.4K

Citations

3.1K

Authors

512

Institutions

Publications per year

2017–2026

107

Parents

Publications

947

Recent advances on electromigration in very-large-scale-integration of interconnects

K. N. Tu · Journal of Applied Physics · 2003 · 1.1K citations

, , +17

Stress evolution due to electromigration in confined metal lines

M. A. Korhonen, P. Bo rgesen, K. N. Tu et al. · Journal of Applied Physics · 1993 · 733 citations

, , +17

Trends and challenges in VLSI circuit reliability

Cris S. Constantinescu · IEEE Micro · 2003 · 616 citations

, , +17

Reliability of Controlled Collapse Interconnections

K. C. Norris, Abraham H. Landzberg · IBM Journal of Research and Development · 1969 · 483 citations

, , +16

Physics and materials challenges for lead-free solders

K. N. Tu, Andriy Gusak, M. Li · Journal of Applied Physics · 2003 · 356 citations

, , +17

1–5 of 947

Authors

3.1K

  1. CV
    Carl V. Thompson

    Massachusetts Institute of Technology, United States

    30 publications · 1.4K citations

    22

    h-index

  2. PS
    Paul S. Ho

    The University of Texas at Austin, United States

    27 publications · 1.5K citations

    18

    h-index

  3. KC
    Kristof Croes

    IMEC, Belgium

    19 publications · 561 citations

    14

    h-index

  4. CM
    Cher Ming Tan

    Nanyang Technological University, Singapore

    16 publications · 448 citations

    14

    h-index

  5. SX
    Sheldon X.-D. Tan

    University of California, Riverside, United States

    15 publications · 475 citations

    12

    h-index

1–5 of 3.1K

Institutions

512

  1. IBM (United States)

    Armonk, United States

    25 h-index

    242 publications

    9.7K citations

  2. Nanyang Technological University

    Singapore, Singapore

    22 h-index

    86 publications

    2.5K citations

  3. Massachusetts Institute of Technology

    Cambridge, United States

    22 h-index

    65 publications

    3.1K citations

  4. Texas Instruments (United States)

    Dallas, United States

    21 h-index

    63 publications

    2.1K citations

  5. IMEC

    Leuven, Belgium

    20 h-index

    283 publications

    19.5K citations

  6. IBM Research - Thomas J. Watson Research Center

    Yorktown Heights, United States

    18 h-index

    83 publications

    5.6K citations

  7. The University of Texas at Austin

    Austin, United States

    17 h-index

    95 publications

    4.8K citations

  8. Advanced Micro Devices (United States)

    Sunnyvale, United States

    17 h-index

    44 publications

    1.6K citations

1–8 of 512

Venues

  1. Microelectronics Reliability

    87 publications · 2.7K citations

    28

    h-index

  2. Journal of Applied Physics

    43 publications · 3.9K citations

    25

    h-index

  3. IEEE Transactions on Electron Devices

    29 publications · 1.5K citations

    19

    h-index

  4. Applied Physics Letters

    24 publications · 1.4K citations

    19

    h-index

  5. Journal of Electronic Materials

    JEM · 23 publications · 898 citations

    17

    h-index

1–5