Cross-sectional Microscopy

Cross-Sectional Microscopy is a materials characterization technique that involves imaging the internal structure of a semiconductor interface in the plane perpendicular to its surface, enabling atomic-scale resolution of interfacial morphology, defects, and compositional variations across layered heterostructures.

651

Publications

28.6K

Citations

2.7K

Authors

568

Institutions

Publications per year

2017–2026

45

Authors

2.7K

  1. JS
    J. S. Williams

    Australian National University, Australia

    9 publications · 555 citations

    9

    h-index

  2. DJ
    David J. Smith

    Arizona State University, United States

    9 publications · 291 citations

    9

    h-index

  3. ET
    Edward T. Yu

    University of California San Diego, United States

    7 publications · 243 citations

    7

    h-index

  4. RM
    R. M. Feenstra

    Carnegie Mellon University, United States

    6 publications · 360 citations

    6

    h-index

  5. MB
    Matthew B. Johnson

    University of Oklahoma, United States

    6 publications · 287 citations

    6

    h-index

1–5 of 2.7K

Venues

  1. Applied Physics Letters

    190 publications · 10.9K citations

    55

    h-index

  2. Journal of Applied Physics

    97 publications · 3.8K citations

    34

    h-index

  3. Japanese Journal of Applied Physics

    JJAP · 35 publications · 847 citations

    18

    h-index

  4. 15

    h-index

  5. 12

    h-index

1–5