Cross-sectional Microscopy
Cross-Sectional Microscopy is a materials characterization technique that involves imaging the internal structure of a semiconductor interface in the plane perpendicular to its surface, enabling atomic-scale resolution of interfacial morphology, defects, and compositional variations across layered heterostructures.
651
Publications
28.6K
Citations
2.7K
Authors
568
Institutions
Publications per year
2017–2026
45
Parents
651
Controlled Growth and Structures of Molecular-Scale Silicon Nanowires
Yue Wu, Yi Cui, Lynn Huynh et al. · Nano Letters · 2004 · 953 citations
Natural Sciences, Materials Engineering, Materials Science +17
1–5 of 651
2.7K
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9
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7
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6
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6
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1–5 of 2.7K
568
IBM Research - Thomas J. Watson Research Center
Yorktown Heights, United States
17 h-index
61 publications
4.2K citations

Australian National University
Canberra, Australia
14 h-index
56 publications
2.7K citations

Chinese Academy of Sciences
Beijing, China
13 h-index
67 publications
2K citations
University of Illinois Urbana-Champaign
Urbana, United States
11 h-index
38 publications
1.6K citations
The University of Texas at Austin
Austin, United States
11 h-index
44 publications
1.3K citations

Centre National de la Recherche Scientifique
Paris, France
10 h-index
42 publications
1.2K citations

Hungarian Academy of Sciences
Budapest, Hungary
10 h-index
27 publications
539 citations
AT&T (United States)
Bedminster, United States
10 h-index
48 publications
10K citations
1–8 of 568
190 publications · 10.9K citations
55
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97 publications · 3.8K citations
34
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JJAP · 35 publications · 847 citations
18
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22 publications · 564 citations
15
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13 publications · 527 citations
12
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