Totally relaxed Ge<i>x</i>Si1−<i>x</i> layers with low threading dislocation densities grown on Si substrates

Abstract

We have grown compositionally graded GexSi1−x layers on Si at 900 °C with both molecular beam epitaxy and rapid thermal chemical vapor deposition techniques. Triple-crystal x-ray diffraction reveals that for 0.10&amp;lt;x&amp;lt;0.53, the layers are totally relaxed. GexSi1−x cap layers grown on these graded layers are threading-dislocation-free when examined with conventional plan-view and cross-sectional transmission electron microscopy. Electron beam induced current images were used to count the low threading dislocation densities, which were 4×105±5×104 cm−2 and 3×106±2×106 cm−2 Eq. 2×106 cm−2 for x=0.23 and x=0.50, respectively. Photoluminescence spectra from the cap layers are identical to photoluminescence from bulk GexSi1−x.