Applied Physics Letters · 1993 · 437 citations · 13 references
Oxide HeterostructuresMaterials EngineeringMultiferroicsMaterials ScienceEpitaxial Ferroelectric Srruo3/pbMetal ElectrodesEngineeringEpitaxial GrowthOxide ElectronicsFerroelectric ApplicationO3/srruo3 HeterostructuresApplied PhysicsFerroelectric MaterialsThin FilmsEpitaxial Ferroelectric HeterostructuresMolecular Beam EpitaxyFunctional Materials
Epitaxial ferroelectric SrRuO3/Pb(Zr0.52Ti0.48)O3/SrRuO3 heterostructures have been fabricated employing isotropic metallic oxide electrodes on (100) SrTiO3 and (100) Si with an yttria stabilized zirconia buffer layer. The structures have been grown in situ by 90° off-axis sputtering, which allows the growth of uniform stoichiometric films over large areas with excellent step coverage. X-ray diffraction, Rutherford backscattering spectroscopy, and cross-sectional transmission electron microscopy reveal high crystalline quality and coherent interfaces. They exhibit superior fatigue characteristics over those made with metal electrodes, showing little degradation over 1010 cycles, with a large remnant polarization.
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J. F. Scott, Carlos A. Paz de Araújo · Science · 1989 · 3.8K citations
C. Sawyer, C. H. Tower · Physical Review · 1930 · 991 citations
Materials Science, Materials Engineering, Solid-state Ionic +14
Chang‐Beom Eom, Jian Sun, Kiyoshi Yamamoto et al. · Applied Physics Letters · 1989 · 419 citations
Single-target Magnetron Sputtering, Superconducting Material, Thin Film Physics +19