Complementary Metal-oxide-semiconductor Simulation

Complementary Metal-Oxide-Semiconductor Simulation is a computational modeling approach that enables the analysis and prediction of electrical behavior in Complementary Metal-Oxide-Semiconductor (CMOS) devices by solving semiconductor physics equations under specific material, geometric, and operational constraints.

359

Publications

13.1K

Citations

1.3K

Authors

364

Institutions

Publications per year

2017–2026

60

Variants

Cmos Simulation

Authors

1.3K

  1. AA
    Asen Asenov

    University of Glasgow, United Kingdom

    8 publications · 214 citations

    8

    h-index

  2. AR
    A. R. Brown

    University of Glasgow, United Kingdom

    7 publications · 165 citations

    7

    h-index

  3. MC
    Mansun Chan

    Hong Kong University of Science and Technology, Hong Kong SAR China

    6 publications · 181 citations

    6

    h-index

  4. LW
    L. W. Massengill

    Vanderbilt University, United States

    5 publications · 337 citations

    5

    h-index

  5. RD
    R.W. Dutton

    Stanford University, United States

    5 publications · 153 citations

    5

    h-index

1–5 of 1.3K

Venues

  1. IEEE Transactions on Electron Devices

    35 publications · 2.1K citations

    23

    h-index

  2. Solid-State Electronics

    22 publications · 777 citations

    17

    h-index

  3. 17

    h-index

  4. IEEE Transactions on Nuclear Science

    20 publications · 938 citations

    16

    h-index

  5. IEEE Electron Device Letters

    17 publications · 492 citations

    15

    h-index

1–5