Complementary Metal-oxide-semiconductor Simulation
Complementary Metal-Oxide-Semiconductor Simulation is a computational modeling approach that enables the analysis and prediction of electrical behavior in Complementary Metal-Oxide-Semiconductor (CMOS) devices by solving semiconductor physics equations under specific material, geometric, and operational constraints.
359
Publications
13.1K
Citations
1.3K
Authors
364
Institutions
Publications per year
2017–2026
60
Variants
Cmos Simulation
Parents
359
1–5 of 359
1.3K
8
h-index
7
h-index
Hong Kong University of Science and Technology, Hong Kong SAR China
6 publications · 181 citations
6
h-index
5
h-index
5
h-index
1–5 of 1.3K
364
University of California, Berkeley
Berkeley, United States
14 h-index
49 publications
1.4K citations
STMicroelectronics (France)
Montrouge, France
10 h-index
32 publications
1K citations
Arizona State University
Tempe, United States
10 h-index
25 publications
2.5K citations

University of Glasgow
Glasgow, United Kingdom
10 h-index
49 publications
1.1K citations
Stanford University
Stanford, United States
9 h-index
17 publications
746 citations
Philips (Netherlands)
Amsterdam, The Netherlands
9 h-index
9 publications
404 citations
Texas Instruments (United States)
Dallas, United States
9 h-index
24 publications
1.1K citations
University of Illinois Urbana-Champaign
Urbana, United States
8 h-index
16 publications
640 citations
1–8 of 364
35 publications · 2.1K citations
23
h-index
22 publications · 777 citations
17
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21 publications · 806 citations
17
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20 publications · 938 citations
16
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17 publications · 492 citations
15
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1–5