Concepedia

Assist Feature Optimization

Assist Feature Optimization is a computational methodology in mask design that systematically enhances the placement and configuration of sub-resolution assist features to improve pattern fidelity and process window in photolithography.

33

Publications

787

Citations

174

Authors

29

Institutions

Publications per year

2017–2026

2

Parents

Publications

33

Fast inverse lithography technology

Daniel S. Abrams, Linyong Pang · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 98 citations

, , +12

<title>Automated optical proximity correction: a rules-based approach</title>

O.W. Otto, Joseph G. Garofalo, Kevin Low et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1994 · 81 citations

, , +14

An innovative Source-Mask co-Optimization (SMO) method for extending low k1 imaging

Stephen Hsu, Luoqi Chen, Zhipan Li et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 50 citations

, , +12

Process optimization through model based SRAF printing prediction

Ramya Viswanathan, Jaione Tirapu-Azpiroz, Punitha Selvam · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 46 citations

, , +12

Mask assisted off-axis illumination technique for random logic

Joseph G. Garofalo, C. J. Biddick, R. L. Kostelak et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1993 · 35 citations

, , +9

1–5 of 33

Authors

174

  1. SH
    Stephen Hsu

    Augusta University, United States

    4 publications · 102 citations

    4

    h-index

  2. EH
    Eric Hendrickx

    IMEC, Belgium

    3 publications · 46 citations

    3

    h-index

  3. LW
    Lars W. Liebmann

    IBM (United States), United States

    3 publications · 70 citations

    3

    h-index

  4. LC
    Luoqi Chen

    ASML (Netherlands), Netherlands

    3 publications · 86 citations

    3

    h-index

  5. HL
    Huayu Liu

    Tianjin University of Science and Technology, China

    3 publications · 86 citations

    3

    h-index

1–5 of 174

Institutions

29

  1. Mentor Technologies

    Tulsa, United States

    3 h-index

    10 publications

    126 citations

  2. GlobalFoundries (United States)

    Santa Clara, United States

    3 h-index

    11 publications

    189 citations

  3. IMEC

    Leuven, Belgium

    3 h-index

    7 publications

    117 citations

  4. Luminex (United States)

    Austin, United States

    3 h-index

    11 publications

    430 citations

  5. Rochester Institute of Technology

    Rochester, United States

    2 h-index

    2 publications

    28 citations

  6. Samsung (South Korea)

    Seoul, South Korea

    2 h-index

    6 publications

    99 citations

  7. ASML (Netherlands)

    Veldhoven, The Netherlands

    2 h-index

    15 publications

    241 citations

  8. University of Delaware

    Newark, United States

    2 h-index

    2 publications

    40 citations

1–8 of 29

Venues

  1. 15

    h-index

  2. 2

    h-index

  3. Applied Optics

    AO · 1 publications · 25 citations

    1

    h-index

  4. 1

    h-index

  5. Optical Microlithography XVIII

    1 publications · 10 citations

    1

    h-index

1–5