Jaione Tirapu-Azpiroz

Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process

Kafai Lai, Alan E. Rosenbluth, Saeed Bagheri et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 47 citations

Electrical Engineering, Pixelated Illumination, Engineering +15

Boundary layer model to account for thick mask effects in photolithography

Jaione Tirapu-Azpiroz, Paul Burchard, Eli Yablonovitch · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 45 citations

Short Wavelength Optic, Engineering, Electron-beam Lithography +19

Process optimization through model based SRAF printing prediction

Ramya Viswanathan, Jaione Tirapu-Azpiroz, Punitha Selvam · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 44 citations

Engineering, Electron-beam Lithography, Industrial Engineering +20

Intensive optimization of masks and sources for 22nm lithography

Alan E. Rosenbluth, David Melville, Kehan Tian et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 30 citations

Mask Optimization, Engineering, Electron-beam Lithography +11

Benefits and trade-offs of global source optimization in optical lithography

Kehan Tian, Azalia A. Krasnoperova, David Melville et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 27 citations

Optical Materials, Engineering, Electron-beam Lithography +20