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45
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1
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2003
Active since
Affiliations
Paul Burchard is an author at University of California, Los Angeles specializing in natural sciences, geometric modeling, and computational electromagnetics.
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PhysicsPhotonicsEngineeringNanophotonicsApplied PhysicsOptical SystemsOptoelectronicsNatural SciencesGeometry ModelingOptical Properties
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2003–2003
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Boundary layer model to account for thick mask effects in photolithography
Jaione Tirapu-Azpiroz, Paul Burchard, Eli Yablonovitch · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 45 citations
Short Wavelength Optic, Engineering, Electron-beam Lithography +19
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