Limit of gate oxide thickness scaling in MOSFETs due to apparent threshold voltage fluctuation induced by tunnel leakage current

M. Koh, Wataru Mizubayashi, Kunihiko Iwamoto, +7

IEEE Transactions on Electron Devices

Electrical EngineeringSemiconductor DeviceEngineeringTunneling MicroscopyPhysics +10

Fundamental limit of gate oxide thickness scaling in advanced MOSFETs

M. Hirose, M. Koh, Wataru Mizubayashi, +3

Semiconductor Science and Technology

Device ModelingElectrical EngineeringTunnel ResistanceEngineeringTunneling Microscopy +12

Development of single-ion implantation — controllability of implanted ion number

Takashi Matsukawa, T. Fukai, Shinsuke Suzuki, +3

Applied Surface Science

Ion ImplantationEngineeringBioelectronicsIon BeamElectrophysiology +4

New Process for Si Nanopyramid Array (NPA) Fabrication by Ion-Beam Irradiation and Wet Etching

M. Koh, S. Sawara, Tomomi Goto, +2

Japanese Journal of Applied Physics

EngineeringOptoelectronic DevicesSilicon On InsulatorIon ImplantationNanoengineering +22

Simple nanostructuring on silicon surface by means of focused beam patterning and wet etching

M. Koh, S. Sawara, Tetsuro Shinada, +3

Applied Surface Science

Materials ScienceEngineeringBeam LithographyMicrofabricationNanotechnology +12

Ion microprobe system at Waseda University for semiconductor analysis

Iwao Ohdomari, M. Sugimori, M. Koh, +6

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms

Electrical EngineeringEngineeringAnalytical ChemistryIon BeamIon Microprobe System +2

Quantitative Evaluation of Dopant Loss in 5–10 keV As Ion Implantation for Low-Resistive, Ultrashallow Source/Drain Formation

M. Koh, K Furumoto, T. Seo, +2

Japanese Journal of Applied Physics

Semiconductor TechnologyElectrical EngineeringIon ImplantationEngineeringCrystalline Defects +10

Dopant Loss Origins of Low Energy Implanted Arsenic and Antimony for Ultra Shallow Junction Formation

Kentaro Shibahara, Hiroaki Furumoto, Kazuhiko Egusa, +2

MRS Proceedings

Materials EngineeringMaterials ScienceIon ImplantationEngineeringDopant Loss Origins +5

Steam-assisted laser ablation and its signal diagnostics

Minghui Hong, M. Koh, Sha Zhu, +2

Applied Surface Science

Steam-assisted Laser AblationEngineeringLaser ApplicationsLaser AblationLaser Processing Technology +3

Ion microprobe system combined with scanning electron microscope for high precision aiming

Iwao Ohdomari, M. Sugimori, M. Koh, +7

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms

MicroscopyScanning Probe MicroscopyElectron MicroscopeIon BeamBiomedical Engineering +3