Susan B. Felch

Effect of amorphization and carbon co-doping on activation and diffusion of boron in silicon

B. J. Pawlak, T. Janssens, Bert Brijs et al. · Applied Physics Letters · 2006 · 63 citations

Engineering, Silicon On Insulator, Carbon Co-doping +16

Plasma immersion ion implantation of SiF4 and BF3 for sub-100 nm <i>P</i>+/<i>N</i> junction fabrication

Xueyu Qian, N.W. Cheung, M. A. Lieberman et al. · Applied Physics Letters · 1991 · 58 citations

Semiconductor Technology, Electrical Engineering, Electronic Devices +14

Suppression of phosphorus diffusion by carbon co-implantation

B. J. Pawlak, Ray Duffy, T. Janssens et al. · Applied Physics Letters · 2006 · 56 citations

Engineering, P Junctions, Integrated Circuits +18

Characteristics of a plasma doping system for semiconductor device fabrication

Tt Sheng, Susan B. Felch, C. B. Cooper · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1994 · 51 citations

Semiconductors, Semiconductor Devices, Electrical Engineering +13

Plasma doping for the fabrication of ultra-shallow junctions

Susan B. Felch, Ziwei Fang, Bon Wong Koo et al. · Surface and Coatings Technology · 2002 · 46 citations

Engineering, Physics, Nanoelectronics +4