Nobuyuki Negishi

Atomic layer etching of silicon nitride using cyclic process with hydrofluorocarbon chemistry

Yohei Ishii, Kazumasa Okuma, Tiffany Saldana et al. · Japanese Journal of Applied Physics · 2017 · 49 citations

Engineering, Atomic Layer Etching, Silicon On Insulator +16

Investigation of Bowing Reduction in SiO₂ Etching Taking into Account Radical Sticking in a Hole

Masaru Izawa, Nobuyuki Negishi, Ken’etsu Yokogawa et al. · Japanese Journal of Applied Physics · 2007 · 40 citations

Materials Science, High-aspect-ratio Contact Hole, Engineering +14

Effects of Mask and Necking Deformation on Bowing and Twisting in High-Aspect-Ratio Contact Hole Etching

Masatoshi Miyake, Nobuyuki Negishi, Masaru Izawa et al. · Japanese Journal of Applied Physics · 2009 · 38 citations

Incident Ion Flux, Ion Implantation, Engineering +8

Bottom profile degradation mechanism in high aspect ratio feature etching based on pattern transfer observation

Nobuyuki Negishi, Masatoshi Miyake, Ken’etsu Yokogawa et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2017 · 36 citations

Engineering, Pattern Transfer Observation, Microfabrication +8

Progress and perspectives in dry processes for nanoscale feature fabrication: fine pattern transfer and high-aspect-ratio feature formation

Taku Iwase, Yoshito Kamaji, Song Kang et al. · Japanese Journal of Applied Physics · 2019 · 33 citations

Engineering, Electron-beam Lithography, Pattern Transfer +21