Nobuyuki Negishi

Atomic layer etching of silicon nitride using cyclic process with hydrofluorocarbon chemistry

Yohei Ishii, Kazumasa Okuma, Tiffany Saldana et al. · Japanese Journal of Applied Physics · 2017 · 52 citations

Engineering, Materials Engineering, Materials Science +17

Effects of Mask and Necking Deformation on Bowing and Twisting in High-Aspect-Ratio Contact Hole Etching

Masatoshi Miyake, Nobuyuki Negishi, Masaru Izawa et al. · Japanese Journal of Applied Physics · 2009 · 44 citations

Engineering, Manufacturing Engineering, Materials Science +14

Investigation of Bowing Reduction in SiO₂ Etching Taking into Account Radical Sticking in a Hole

Masaru Izawa, Nobuyuki Negishi, Ken’etsu Yokogawa et al. · Japanese Journal of Applied Physics · 2007 · 40 citations

Natural Sciences, Materials Engineering, Materials Science +13

Bottom profile degradation mechanism in high aspect ratio feature etching based on pattern transfer observation

Nobuyuki Negishi, Masatoshi Miyake, Ken’etsu Yokogawa et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2017 · 39 citations

Engineering, Materials Engineering, Materials Science +16

Progress and perspectives in dry processes for nanoscale feature fabrication: fine pattern transfer and high-aspect-ratio feature formation

Taku Iwase, Yoshito Kamaji, Song Kang et al. · Japanese Journal of Applied Physics · 2019 · 39 citations

Engineering, Manufacturing Engineering, Materials Science +15