Masaru Izawa

Deposition control for reduction of 193nm photoresist degradation in dielectric etching

Naoki Negishi, Hiroki Takesue, Masahiro Sumiya et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2005 · 70 citations

Dielectric Etching, Arf Resist, Engineering +21

Calculation of hyperfine splitting constants with Slater-type cusp basis by the symmetry adapted cluster-configuration interaction theory

Hiroshi Nakatsuji, Masaru Izawa · The Journal of Chemical Physics · 1989 · 58 citations

Better Hfsc, Physics, Theoretical Inorganic Chemistry +15

Atomic layer etching of silicon nitride using infrared annealing for short desorption time of ammonium fluorosilicate

Nobuya Miyoshi, Hiroyuki Kobayashi, Kazunori Shinoda et al. · Japanese Journal of Applied Physics · 2017 · 55 citations · Full text

Engineering, Atomic Layer Etching, Optoelectronic Devices +19

Investigation of Bowing Reduction in SiO₂ Etching Taking into Account Radical Sticking in a Hole

Masaru Izawa, Nobuyuki Negishi, Ken’etsu Yokogawa et al. · Japanese Journal of Applied Physics · 2007 · 40 citations

Materials Science, High-aspect-ratio Contact Hole, Engineering +14

Effects of Mask and Necking Deformation on Bowing and Twisting in High-Aspect-Ratio Contact Hole Etching

Masatoshi Miyake, Nobuyuki Negishi, Masaru Izawa et al. · Japanese Journal of Applied Physics · 2009 · 38 citations

Incident Ion Flux, Ion Implantation, Engineering +8