Atomic layer etching of silicon nitride using infrared annealing for short desorption time of ammonium fluorosilicate

Nobuya Miyoshi, Hiroyuki Kobayashi, Kazunori Shinoda, +6

Japanese Journal of Applied Physics

EngineeringAtomic Layer EtchingOptoelectronic DevicesIntegrated CircuitsAmmonium Fluorosilicate +17

High-pressure phase transition and behavior of protons in brucite Mg(OH) 2 : a high-pressure-temperature study using IR synchrotron radiation

Keiji Shinoda, M. Yamakata, Tetsuya Nanba, +7

Physics and Chemistry of Minerals

Materials ScienceIr Synchrotron RadiationMineral PhysicEngineeringNuclear Physics +7

Growth of bulk GaN crystals by Na flux method

Yusuke Mori, Yasuo Kitaoka, Mamoru Imade, +3

Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics

Materials ScienceElectrical EngineeringEngineeringCrystalline DefectsGrowth Rate +7

Growth of GaN crystals by Na flux LPE method

Yusuke Mori, Yasuo Kitaoka, Mamoru Imade, +4

physica status solidi (a)

Materials ScienceElectrical EngineeringEngineeringApplied PhysicsSeed Substrate +6

Self-limiting reactions of ammonium salt in CHF3/O2 downstream plasma for thermal-cyclic atomic layer etching of silicon nitride

Kazunori Shinoda, Nobuya Miyoshi, Hiroyuki Kobayashi, +4

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

EngineeringChemistrySilicon On InsulatorPlasma ProcessingChemical Engineering +15

Selective atomic-level etching using two heating procedures, infrared irradiation and ion bombardment, for next-generation semiconductor device manufacturing

Kazunori Shinoda, Nobuya Miyoshi, Hiroyuki Kobayashi, +14

Journal of Physics D Applied Physics

EngineeringElectron-beam LithographyTarget FabricationSilicon On InsulatorPlasma Processing +19

Polarized infrared spectroscopic study of diffusion of water molecules along structure channels in beryl

Junichi Fukuda, Keiji Shinoda, Satοru Nakashima, +2

American Mineralogist

EngineeringChemistryWater MoleculesWater-rock InteractionChemical Engineering +18

Rapid thermal-cyclic atomic-layer etching of titanium nitride in CHF ₃ /O ₂ downstream plasma

Kazunori Shinoda, Nobuya Miyoshi, Hiroyuki Kobayashi, +3

Journal of Physics D Applied Physics

Atomic layer etching of SiO2 with self-limiting behavior on the surface modification step using sequential exposure of HF and NH3

Nobuya Miyoshi, Hiroyuki Kobayashi, Kazunori Shinoda, +4

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Nh3 GasesSurface Modification StepEngineeringSequential ExposureAtomic Layer Etching +15

Atomic layer etching of Si3N4 with high selectivity to SiO2 and poly-Si

Nobuya Miyoshi, Kazunori Shinoda, Hiroyuki Kobayashi, +3

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

EngineeringAtomic Layer EtchingChemistrySilicon On InsulatorAle Process +16