Yohei Ishii

Atomic layer etching of silicon nitride using cyclic process with hydrofluorocarbon chemistry

Yohei Ishii, Kazumasa Okuma, Tiffany Saldana et al. · Japanese Journal of Applied Physics · 2017 · 49 citations

Engineering, Atomic Layer Etching, Silicon On Insulator +16

Stress evolution in Si during low-energy ion bombardment

Yohei Ishii, Charbel S. Madi, Michael J. Aziz et al. · Journal of materials research/Pratt's guide to venture capital sources · 2014 · 26 citations · Full text

Ion Implantation, Engineering, Physics +5

Selective atomic-level etching using two heating procedures, infrared irradiation and ion bombardment, for next-generation semiconductor device manufacturing

Kazunori Shinoda, Nobuya Miyoshi, Hiroyuki Kobayashi et al. · Journal of Physics D Applied Physics · 2017 · 25 citations

Engineering, Electron-beam Lithography, Target Fabrication +21

Anisotropic selective etching between SiGe and Si

Yohei Ishii, Ritchie Scott-McCabe, Kazumasa Okuma et al. · Japanese Journal of Applied Physics · 2018 · 15 citations

Materials Science, Electrical Engineering, Engineering +13