Shoji Mimotogi

Self-Aligned Double and Quadruple Patterning-aware grid routing with hotspots control

Chikaaki Kodama, Koichi Nakayama, Shigeki Nojima et al. · 2013 · 40 citations

Computing, Computer Engineering, Computer Science +12

Novel error mode analysis method for graphoepitaxial directed self-assembly lithography based on the dissipative particle dynamics method

Katsuyoshi Kodera, Shimon Maeda, Satoshi Tanaka et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 26 citations

Natural Sciences, Materials Science, Physics +13

A 45nm High Performance Bulk Logic Platform Technology (CMOS6) using Ultra High NA(1.07) Immersion Lithography with Hybrid Dual-Damascene Structure and Porous Low-k BEOL

H. Nii, T. Sanuki, Y. Okayama et al. · 2006 · 22 citations

Engineering, Computer Engineering, Electrical Engineering +14

<title>Self-aligned double and quadruple patterning layout principle</title>

Koichi Nakayama, Chikaaki Kodama, Toshiya Kotani et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 21 citations

Architecture, Design, Computer-aided Design +9

Resist edge roughness with reducing pattern size

Eishi Shiobara, Daisuke Kawamura, Kentaro Matsunaga et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1998 · 14 citations

Natural Sciences, Chemistry, Analytical Chemistry +5