Daisuke Kawamura

EUV resist development in Selete

Daisuke Kawamura, Koji Kaneyama, Shinji Kobayashi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 26 citations

Engineering, Electrical Engineering, Materials Science +12

Resist edge roughness with reducing pattern size

Eishi Shiobara, Daisuke Kawamura, Kentaro Matsunaga et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1998 · 14 citations

Natural Sciences, Chemistry, Analytical Chemistry +5

Applicability of extreme ultraviolet lithography to fabrication of half pitch 35nm interconnects

Hajime Aoyama, Yuusuke Tanaka, Kazuo Tawarayama et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 13 citations

Engineering, Electrical Engineering, Manufacturing Engineering +17

Pattern transfer process development for EUVL

Daisuke Kawamura, Yuusuke Tanaka, Toshiro Itani et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 12 citations

Engineering, Manufacturing Engineering, Materials Science +17

Nanopatterning of diblock copolymer directed self-assembly lithography with wet development

Makoto Muramatsu, Mitsuaki Iwashita, Takahiro Kitano et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 12 citations

Engineering, Materials Engineering, Materials Science +15