Eishi Shiobara

Development of Tool for Contamination Layer Thickness Measurement Using High Power Extreme Ultraviolet Light and in Situ Ellipsometer

Takeo Watanabe, Yukiko Kikuchi, T. Takahashi et al. · Japanese Journal of Applied Physics · 2013 · 23 citations

Ultraviolet Light, Vacuum Environment, Optical Materials +16

A study of CD budget in spacer patterning technology

Hidefumi Mukai, Eishi Shiobara, Shinya Takahashi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 18 citations

Engineering, Electronic Design Automation, Electronic Design +21

Comparison of Resist Outgassing Characterization between High Power EUV and EB

Norihiko Sugie, T. Takahashi, Kazuhiro Katayama et al. · Journal of Photopolymer Science and Technology · 2012 · 16 citations · Full text

Short Wavelength Optic, Engineering, Electron-beam Lithography +19

Resist edge roughness with reducing pattern size

Eishi Shiobara, Daisuke Kawamura, Kentaro Matsunaga et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1998 · 14 citations

Specific Resistance, Resistor, Resist Edge Roughness +3

Resist outgassing characterization for qualification in high power EUV lithography

T. Takahashi, Norihiko Sugie, Kazuhiro Katayama et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 14 citations

Materials Science, Electrical Engineering, Short Wavelength Optic +13