Kazuhiro Katayama

Development of Tool for Contamination Layer Thickness Measurement Using High Power Extreme Ultraviolet Light and in Situ Ellipsometer

Takeo Watanabe, Yukiko Kikuchi, T. Takahashi et al. · Japanese Journal of Applied Physics · 2013 · 23 citations

Ultraviolet Light, Vacuum Environment, Optical Materials +16

Comparison of Resist Outgassing Characterization between High Power EUV and EB

Norihiko Sugie, T. Takahashi, Kazuhiro Katayama et al. · Journal of Photopolymer Science and Technology · 2012 · 16 citations · Full text

Short Wavelength Optic, Engineering, Electron-beam Lithography +19

Resist outgassing characterization for qualification in high power EUV lithography

T. Takahashi, Norihiko Sugie, Kazuhiro Katayama et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 14 citations

Materials Science, Electrical Engineering, Short Wavelength Optic +13

Study of EUV outgassing spatial distribution toward witness plate in the EUV outgas tester

Yukiko Kikuchi, Eishi Shiobara, Isamu Takagi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 11 citations

Chemical Engineering, Engineering, Monte-carlo Modelling +13

Comparison of Resist Family Outgassing Characterization between EUV and EB

Isamu Takagi, T. Takahashi, Norihiko Sugie et al. · Journal of Photopolymer Science and Technology · 2013 · 10 citations · Full text