Kentaro Matsunaga - Concepedia

Author

Kentaro Matsunaga

Toshiba (Japan)

Also Known As

Kentaro MATSUNAGA, Kentaro Matsunaga

Publications

387

Citations

H-Index

Concepts

All Affiliations

Toshiba (Japan)

About

Kentaro Matsunaga is an author at Toshiba (Japan) specializing in engineering, microelectronics, and materials engineering.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	6	6	262
2	Applied Physics	4	4	87
3	Electrical Engineering	3	3	49
4	Chemical Engineering	1	1	131
5	Computer Engineering	1	1	44

Kentaro Matsunaga

Publications

289

Citations

H-Index

Page 1

	Year	Citations
Hydrogen production by high temperature electrolysis with nuclear reactor Seiji Fujiwara, Shigeo Kasai, H. Yamauchi, Progress in Nuclear Energy Chemical EngineeringEngineeringHydrogen ProductionHigh Temperature ElectrolysisHydrogen Production Technology	2008	131
Mass-production technology for CIGS modules Kentaro Matsunaga, Takashi Komaru, Yuji Nakayama, Solar Energy Materials and Solar Cells Industrial DesignEngineeringProduction TechnologyIndustrial EngineeringComputer Engineering	2009	44
The Effect of Strain Distribution on Abnormal Grain Growth in Cu Thin Films Miki Moriyama, Kentaro Matsunaga, Toshifumi Morita, MATERIALS TRANSACTIONS EngineeringSevere Plastic DeformationChemical DepositionCu Thin FilmsIntrinsic Strain	2004	38
Development of resist material and process for hp-2x-nm devices using EUV lithography Kentaro Matsunaga, Hiroaki Oizumi, Koji Kaneyama, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Optical MaterialsEngineeringElectron-beam LithographyEuv LithographyResist Material	2010	26
Resist edge roughness with reducing pattern size Eishi Shiobara, Daisuke Kawamura, Kentaro Matsunaga, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Specific ResistanceResistorResist Edge RoughnessMechanical EngineeringAcid Concentration	1998	14
Applicability of extreme ultraviolet lithography to fabrication of half pitch 35nm interconnects Hajime Aoyama, Yuusuke Tanaka, Kazuo Tawarayama, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2010	13
Progress of Resist Materials and Process for hp 2x-nm Devices using EUV Lithography Kentaro Matsunaga, Hiroaki Oizumi, Koji Kaneyama, Journal of Photopolymer Science and Technology Short Wavelength OpticEngineeringElectron-beam LithographyMicroscopyEuv Lithography	2010	13
Development status of EUV resist materials and processing at Selete Kentaro Matsunaga, Gousuke Shiraishi, Julius Joseph Santillian, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyMechanical EngineeringPolymer ResistSelete R	2011	10

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