Koji Kaneyama

EUV resist development in Selete

Daisuke Kawamura, Koji Kaneyama, Shinji Kobayashi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 26 citations

Engineering, Electron-beam Lithography, Optical Testing +16

Development of resist material and process for hp-2x-nm devices using EUV lithography

Kentaro Matsunaga, Hiroaki Oizumi, Koji Kaneyama et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 26 citations

Optical Materials, Engineering, Electron-beam Lithography +19

Optimizing CD uniformity by total PEB cycle temperature control on track equipment

Akihiro Hisai, Koji Kaneyama, Charles Pieczulewski · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2002 · 20 citations

Electrical Engineering, Wafer Scale Processing, Engineering +15

Progress of Resist Materials and Process for hp 2x-nm Devices using EUV Lithography

Kentaro Matsunaga, Hiroaki Oizumi, Koji Kaneyama et al. · Journal of Photopolymer Science and Technology · 2010 · 13 citations · Full text

Short Wavelength Optic, Engineering, Electron-beam Lithography +20

Study of post-develop defect on typical EUV resist

Masahiko Harumoto, Kazuhito Shigemori, Akihiro Hisai et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 12 citations

Materials Engineering, Materials Science, Electrical Engineering +11