Y. Okayama

Leakage Current Mechanism of Amorphous and Polycrystalline Ta2 O 5 Films Grown by Chemical Vapor Deposition

Tomonori Aoyama, S. Saida, Y. Okayama et al. · Journal of The Electrochemical Society · 1996 · 86 citations

Materials Science, Electrical Engineering, Poole‐frenkel Type Leakage +13

High performance CMOSFET technology for 45nm generation and scalability of stress-induced mobility enhancement technique

A. Oishi, Osamu Fujii, T. Yokoyama et al. · 2005 · 42 citations

Low-power Electronics, Electrical Engineering, Technology Cmosfet +14

Anomalous hot-carrier induced degradation in very narrow channel nMOSFETs with STI structure

M. Nishigohri, K. Ishimaru, Masahiro Takahashi et al. · 2002 · 26 citations

Electrical Engineering, Engineering, Rf Semiconductor +11

A 45nm High Performance Bulk Logic Platform Technology (CMOS6) using Ultra High NA(1.07) Immersion Lithography with Hybrid Dual-Damascene Structure and Porous Low-k BEOL

H. Nii, T. Sanuki, Y. Okayama et al. · 2006 · 22 citations

Engineering, Ultra High Na, Wafer Scale Processing +16

A high performance 100 nm generation SOC technology (CMOS IV) for high density embedded memory and mixed signal LSIs

Kazuo Miyashita, Takashi Nakayama, A. Oishi et al. · 2002 · 17 citations

Low-power Electronics, System On Chip, Electrical Engineering +13