K. Ishimaru

Newly developed curing unit using blue light-emitting diodes

M Fujibayashi, Kuniko Fujibayashi, K. Ishimaru et al. · Dentistry in Japan · 1998 · 98 citations

White Oled, Electrical Engineering, Solid-state Lighting +5

Challenges and solutions of FinFET integration in an SRAM cell and a logic circuit for 22 nm node and beyond

Hikaru Kawasaki, V. Basker, T. Yamashita et al. · 2009 · 94 citations

Engineering, Vlsi Design, Sidewall Image Transfer +18

Ultra-thin-body and BOX (UTBB) fully depleted (FD) device integration for 22nm node and beyond

Qijiong Liu, A. Yagishita, N. Loubet et al. · 2010 · 79 citations

Low-power Electronics, Device Modeling, Electrical Engineering +15

High-resolution characterization of ultrashallow junctions by measuring in vacuum with scanning spreading resistance microscopy

L. Zhang, K. Ohuchi, K. Adachi et al. · Applied Physics Letters · 2007 · 77 citations

Engineering, Microscopy, Vacuum Device +20

Process integration technology and device characteristics of CMOS FinFET on bulk silicon substrate with sub-10 nm fin width and 20 nm gate length

K. Okano, T. Izumida, H. Kawasaki et al. · 2006 · 76 citations

Electrical Engineering, Bulk Silicon Substrate, Engineering +9