K. Ohuchi

High-resolution characterization of ultrashallow junctions by measuring in vacuum with scanning spreading resistance microscopy

L. Zhang, K. Ohuchi, K. Adachi et al. · Applied Physics Letters · 2007 · 78 citations

Natural Sciences, Electrical Engineering, Materials Science +14

32nm general purpose bulk CMOS technology for high performance applications at low voltage

F. Arnaud, J. Liu, Yong Meng Lee et al. · 2008 · 56 citations

Engineering, Computer Engineering, Electrical Engineering +17

Competitive and cost effective high-k based 28nm CMOS technology for low power applications

F. Arnaud, Aaron Thean, M. Eller et al. · 2009 · 44 citations

Engineering, Computer Engineering, Electrical Engineering +14

A hp22 nm node low operating power (LOP) technology with sub-10 nm gate length planar bulk CMOS devices

Nobuaki Yasutake, K. Ohuchi, M. Fujiwara et al. · 2004 · 36 citations

Engineering, Electrical Engineering, Low-power Design +16

Junction Leakage Generation by NiSi Thermal Instability Characterized Using Damage-Free n⁺/p Silicon Diodes

Masakatsu Tsuchiaki, K. Ohuchi, Chie Hongo · Japanese Journal of Applied Physics · 2004 · 35 citations

Engineering, Electrical Engineering, Materials Science +17