T. Hoffman

A 90-nm logic technology featuring strained-silicon

Scott E. Thompson, M Armstrong, C. Auth et al. · IEEE Transactions on Electron Devices · 2004 · 666 citations

Engineering, Electrical Engineering, Materials Science +17

A Logic Nanotechnology Featuring Strained-Silicon

Scott E. Thompson, M Armstrong, C. Auth et al. · IEEE Electron Device Letters · 2004 · 513 citations

Engineering, Electrical Engineering, Materials Science +17

The device architecture dilemma for CMOS technologies: Opportunities & challenges of finFET over planar MOSFET

Bertrand Parvais, A. Mercha, Nadine Collaert et al. · 2009 · 39 citations

Engineering, Electrical Engineering, Microelectronics +10

Drive current enhancement in p-type metal–oxide–semiconductor field-effect transistors under shear uniaxial stress

L. Shifren, X. Wang, Philippe Matagne et al. · Applied Physics Letters · 2004 · 34 citations

Engineering, Electrical Engineering, Materials Science +16

Conformal Doping of FINFETs: a Fabrication and Metrology Challenge

W. Vandervorst, J.-L. Everaert, Eveline Rosseel et al. · AIP conference proceedings · 2008 · 25 citations · Full text

Engineering, Electrical Engineering, Materials Science +15