Janet Hopkins

Characterization of Extreme Si Thinning Process for Wafer-to-Wafer Stacking

Fumihiro Inoue, Anne Jourdain, Joeri De Vos et al. · 2016 · 25 citations

Engineering, Materials Engineering, Materials Science +13

Developments in Si and SiO 2 etching for MEMS-based optical applications

L.A. Donohue, Janet Hopkins, Richard Barnett et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 22 citations

Engineering, Materials Engineering, Materials Science +17

Extreme wafer thinning optimization for via-last applications

Anne Jourdain, Joeri De Vos, Fumihiro Inoue et al. · 2016 · 17 citations

Engineering, Computer Engineering, Electrical Engineering +17

RIE dynamics for extreme wafer thinning applications

Nouredine Rassoul, Anne Jourdain, Nina Tutunjyan et al. · Microelectronic Engineering · 2018 · 17 citations

Engineering, Manufacturing Engineering, Materials Science +13

<title>Etching 200-mm diameter SCALPEL masks with the ASE process</title>

Ian Ronald Johnston, Huma Ashraf, Jy Bhardwaj et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2000 · 10 citations

Engineering, Manufacturing Engineering, Materials Engineering +15