Barry O’Sullivan - Concepedia

Author

Barry O’Sullivan

Also Known As

B J O'Sullivan, B O’Sullivan, B. J O'Sullivan, B. J. O'Sullivan, B. J. O’Sullivan, B. O'Sullivan, B. Osullivan, B. O’Sullivan, B.J O’Sullivan, B.J. O'Sullivan

153

Publications

1.5K

Citations

H-Index

Concepts

All Affiliations

IMEC KU Leuven Institut polytechnique de Grenoble University College London National Microelectronics Applications Centre (Ireland)

About

Barry O’Sullivan is an author at IMEC specializing in engineering, applied physics, and electrical engineering.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	16	35	999
2	Applied Physics	15	31	885
3	Natural Sciences	5	5	126
4	Chemistry	5	5	132
5	Chemical Engineering	2	2	26

Barry O’Sullivan

Publications

1.1K

Citations

H-Index

Page 1

	Year	Citations
Comphy — A compact-physics framework for unified modeling of BTI G. Rzepa, J. Franco, Barry O’Sullivan, Microelectronics Reliability EngineeringPhysicsNumerical SimulationApplied PhysicsUnified Modeling	2018	196
Crystalline thin‐foil silicon solar cells: where crystalline quality meets thin‐film processing Frédéric Dross, Kris Baert, Twan Bearda, Progress in Photovoltaics Research and Applications EngineeringPhotovoltaic DevicesThin Film Process TechnologyPhotovoltaic SystemPhotovoltaics	2012	78
Estimation of fixed charge densities in hafnium-silicate gate dielectrics V. Kaushik, Barry O’Sullivan, Geoffrey Pourtois, IEEE Transactions on Electron Devices Materials ScienceElectrical EngineeringWafer Scale ProcessingEngineeringFixed Charge Densities	2006	67
Interface of ultrathin HfO2 films deposited by UV-photo-CVD Q. Fang, Jinyu Zhang, Z. Wang, Thin Solid Films Ultrathin Hfo2 FilmsEngineeringSurface ScienceApplied PhysicsThin Films	2004	59
Investigation of TiO2-doped HfO2 thin films deposited by photo-CVD Q. Fang, Jinyu Zhang, Z.M. Wang, Thin Solid Films Materials ScienceEngineeringOxide ElectronicsPhoto-electrochemical CellThin Films	2003	55
Investigation of Imprint in FE-HfO₂ and Its Recovery Y. Higashi, B. Kaczer, Anne S. Verhulst, IEEE Transactions on Electron Devices Magnetic PropertiesEngineeringMagnetic ResonanceFerroelectric Random-access MemoryChemistry	2020	43
Passivation of a Metal Contact with a Tunneling Layer Xavier Loozen, J.B. Larsen, Frédéric Dross, Energy Procedia EngineeringSemiconductor DeviceTunneling LayerTunneling MicroscopyNanoelectronics	2012	39
Characterisation of HfO2 deposited by photo-induced chemical vapour deposition Q. Fang, J.-Y. Zhang, Z.M. Wang, Thin Solid Films EngineeringPhotochemistrySurface ScienceHydrogenChemistry	2003	33
Defect profiling in FEFET Si:HfO2 layers Barry O’Sullivan, V. Putcha, Roman Izmailov, Applied Physics Letters Ferroelectric Si-doped Hfo2Electrical EngineeringSemiconductor DeviceDefect ProfilingEngineering	2020	33
Solving the BEOL compatibility challenge of top-pinned magnetic tunnel junction stacks Johan Swerts, Enlong Liu, Sébastien Couet, Magnetic PropertiesEngineeringPinning LayerMagnetic MaterialsMagnetoresistance	2017	29

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