Concepedia

Interface of ultrathin HfO2 films deposited by UV-photo-CVD

Q. Fang, Jinyu Zhang, Z. Wang, M. Modreanu, Barry O’Sullivan, Paul K. Hurley, Timothy Leedham, D. Hywel, M. Audier, Carmen Jiménez,

Thin Solid Films · 2004 · 59 citations · 12 references

DOI

Concepts

References

12

Handbook of X-Ray Photoelectron Spectroscopy

J. F. Moulder · Medical Entomology and Zoology · 1995 · 23.7K citations

, , +10

High-κ gate dielectrics: Current status and materials properties considerations

G. D. Wilk, Robert M. Wallace, J. Anthony · Journal of Applied Physics · 2001 · 5.9K citations

, , +17

Thermochemical data of pure substances

Choice Reviews Online · 1993 · 4.5K citations

, , +14

Thermodynamic stability of binary oxides in contact with silicon

K. J. Hubbard, Darrell G. Schlom · Journal of materials research/Pratt's guide to venture capital sources · 1996 · 1.2K citations

, , +14

Hafnium and zirconium silicates for advanced gate dielectrics

G. D. Wilk, Robert M. Wallace, J. Anthony · Journal of Applied Physics · 2000 · 972 citations

, , +17