Q. Fang

Effect of postdeposition annealing on the thermal stability and structural characteristics of sputtered HfO2 films on Si (100)

Gang He, M. Liu, Li Zhu et al. · Surface Science · 2004 · 216 citations

Materials Science, Materials Engineering, Structural Characteristics +13

Optical and electrical properties of plasma-oxidation derived HfO 2 gate dielectric films

Gaohang He, L.Q. Zhu, M. Liu et al. · Applied Surface Science · 2006 · 113 citations

Materials Science, Electrical Engineering, Optical Materials +12

FTIR and XPS investigation of Er-doped SiO2–TiO2 films

Q. Fang, Mark S. Meier, Jinling Yu et al. · Materials Science and Engineering B · 2003 · 77 citations

Materials Science, Xps Investigation, Engineering +4

Silicate layer formation at HfO2/SiO2/Si interface determined by x-ray photoelectron spectroscopy and infrared spectroscopy

Guangzhi He, Linjie Zhang, Q. Fang · Journal of Applied Physics · 2006 · 63 citations

Materials Science, Molecular Sieve, Silicate Layer Formation +15

Interface of ultrathin HfO2 films deposited by UV-photo-CVD

Q. Fang, Jinyu Zhang, Z. Wang et al. · Thin Solid Films · 2004 · 59 citations

Ultrathin Hfo2 Films, Engineering, Surface Science +4