Statistics
Publications
40
Citations
1.4K
H-Index
22
Active since
2003
Q. Fang is an author at University College London specializing in materials science, natural sciences, and materials engineering.
Publications per year
2003–2023
40
40
Optical and electrical properties of plasma-oxidation derived HfO 2 gate dielectric films
Gaohang He, L.Q. Zhu, M. Liu et al. · Applied Surface Science · 2006 · 114 citations
FTIR and XPS investigation of Er-doped SiO2–TiO2 films
Q. Fang, Mark S. Meier, Jinling Yu et al. · Materials Science and Engineering B · 2003 · 77 citations
Natural Sciences, Materials Engineering, Materials Science +11
Interface of ultrathin HfO2 films deposited by UV-photo-CVD
Q. Fang, Jinyu Zhang, Z. Wang et al. · Thin Solid Films · 2004 · 59 citations
Natural Sciences, Materials Engineering, Materials Science +10
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