L.Q. Zhu

Optical and electrical properties of plasma-oxidation derived HfO 2 gate dielectric films

Gaohang He, L.Q. Zhu, M. Liu et al. · Applied Surface Science · 2006 · 114 citations

Natural Sciences, Materials Science, Physics +16

Characterization of ZnO:N films prepared by annealing sputtered zinc oxynitride films at different temperatures

Jie Zhang, Linjie Zhang, L.Q. Zhu et al. · Journal of Applied Physics · 2007 · 71 citations

Natural Sciences, Chemistry, Materials Science +17

Optimization of microstructure and optical properties of VO2 thin film prepared by reactive sputtering

Yuanyuan Luo, L.Q. Zhu, Yehong Zhang et al. · Journal of Applied Physics · 2013 · 71 citations

Natural Sciences, Materials Science, Physics +16

Spectroscopic ellipsometry characterization of nitrogen-incorporated HfO2 gate dielectrics grown by radio-frequency reactive sputtering

Guangzhi He, Linjie Zhang, G. H. Li et al. · Applied Physics Letters · 2005 · 69 citations

Natural Sciences, Materials Engineering, Materials Science +17

The structural and interfacial properties of HfO2/Si by the plasma oxidation of sputtered metallic Hf thin films

Guangzhi He, Q. Fang, M Liu et al. · Journal of Crystal Growth · 2004 · 56 citations

Natural Sciences, Materials Engineering, Materials Science +16