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The structural and interfacial properties of HfO2/Si by the plasma oxidation of sputtered metallic Hf thin films

Materials ScienceMaterials EngineeringEngineeringPlasma OxidationNanoelectronicsOxide ElectronicsSurface ScienceApplied PhysicsThin FilmsSilicon On InsulatorMicroelectronicsPlasma ProcessingInterfacial PropertiesThin Film Processing