Peter Kuerz

ASML's NXE platform performance and volume introduction

Rudy Peeters, Sjoerd Lok, Erwin van Alphen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 70 citations

High-NA EUV lithography exposure tool: program progress

Jan van Schoot, Eelco van Setten, Kars Troost et al. · 2020 · 58 citations

Engineering, Electron-beam Lithography, Microscopy +24

EUV lithography: NXE platform performance overview

Rudy Peeters, Sjoerd Lok, Joerg Mallman et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 50 citations

EUV lithography with the Alpha Demo Tools: status and challenges

Noreen Harned, M. Goethals, Rogier Groeneveld et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 49 citations

Engineering, Electron-beam Lithography, Target Fabrication +16

High-NA EUV lithography exposure tool: advantages and program progress

Jan van Schoot, Sjoerd Lok, Eelco van Setten et al. · 2020 · 44 citations