C. Constantine

Inductively coupled plasma etching of GaN

R. J. Shul, G McClellan, S.A. Casalnuovo et al. · Applied Physics Letters · 1996 · 212 citations

Materials Science, Wide-bandgap Semiconductor, Electrical Engineering +12

High-density plasma etching of compound semiconductors

R. J. Shul, G McClellan, R. D. Briggs et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1997 · 121 citations

Semiconductors, Materials Science, Electrical Engineering +12

Plasma etching of III–V semiconductors in CH4/H2/Ar electron cyclotron resonance discharges

C. Constantine, D. Johnson, S. J. Pearton et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1990 · 111 citations

Wide-bandgap Semiconductor, Engineering, Gaas Plasma +16

Dry etching of thin-film InN, AlN and GaN

S. J. Pearton, C. R. Abernathy, F. Ren et al. · Semiconductor Science and Technology · 1993 · 66 citations

Materials Science, Materials Engineering, Chemical Engineering +13

Electron cyclotron resonance plasma etching of InP in CH4/H2/Ar

S. J. Pearton, U. K. Chakrabarti, A. P. Kinsella et al. · Applied Physics Letters · 1990 · 62 citations

Electrical Engineering, Optical Materials, Engineering +13