A. P. Kinsella

Plasma etching of III–V semiconductors in CH4/H2/Ar electron cyclotron resonance discharges

C. Constantine, D. Johnson, S. J. Pearton et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1990 · 111 citations

Wide-bandgap Semiconductor, Engineering, Gaas Plasma +16

Electron cyclotron resonance plasma etching of InP in CH4/H2/Ar

S. J. Pearton, U. K. Chakrabarti, A. P. Kinsella et al. · Applied Physics Letters · 1990 · 62 citations

Electrical Engineering, Optical Materials, Engineering +13

Reactive ion etching of GaAs, AlGaAs, and GaSb in Cl2 and SiCl4

S. J. Pearton, U. K. Chakrabarti, W. S. Hobson et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1990 · 47 citations

Engineering, Optoelectronic Devices, Reactive Ion Etching +18

Dry Etching of GaAs , AlGaAs , and GaSb in Hydrochlorofluorocarbon Mixtures

S. J. Pearton, W. S. Hobson, U. K. Chakrabarti et al. · Journal of The Electrochemical Society · 1990 · 27 citations

Materials Science, Chemical Engineering, Engineering +14

Growth and characterization of low defect GaAs by vertical gradient freeze

C. R. Abernathy, A. P. Kinsella, A. S. Jordan et al. · Journal of Crystal Growth · 1987 · 26 citations

Electrical Engineering, Semiconductor Device, Engineering +5