Plasma etching of III–V semiconductors in CH4/H2/Ar electron cyclotron resonance discharges

Abstract

We have investigated the etch rates, residual lattice damage, surface morphologies, and chemistries of InP, InGaAs, AlInAs, and GaAs plasma etched in electron cyclotron resonance (ECR) CH4/H2/Ar discharges. The etch rates of InP and InGaAs increase linearly with additional rf biasing of the substrate, and are approximately a factor of 2 faster than for GaAs. Under our conditions the etch rate of Al0.52Ga0.48As is very low (∼25 Å min−1) even for the addition of 100 V rf bias. In all of these materials the residual damage layer remaining after dry etching is very shallow (∼20 Å) as evidenced from Schottky barrier height and photoluminescence measurements combined with wet chemical etching. InP shows significant P depletion with the addition of rf biasing during the ECR etching while GaAs retains a near-stoichiometric surface. Hydrogen passivation of shallow donors in n-type GaAs occurs to a depth of ∼3000 Å during exposure to the CH4/H2/Ar discharge for long periods (60 min). The surface morphologies in the In-based materials become roughened for etching with the addition of rf biasing while GaAs displays smooth, residue-free surfaces under these conditions.