W. Vandervorst

Growth mechanism and continuity of atomic layer deposited TiN films on thermal SiO2

A. Satta, Jörg Schuhmacher, Caroline M. Whelan et al. · Journal of Applied Physics · 2002 · 90 citations

Film Thickness Control, Engineering, Thin Film Process Technology +16

Suppression of phosphorus diffusion by carbon co-implantation

B. J. Pawlak, Ray Duffy, T. Janssens et al. · Applied Physics Letters · 2006 · 56 citations

Engineering, P Junctions, Integrated Circuits +18

Recent insights into the physical modeling of the spreading resistance point contact

Trudo Clarysse, Peter Wolf, H. Bender et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1996 · 53 citations

Resistance Point Contact, Engineering, Srp Point Contact +22

Low-energy heavy-ion TOF-ERDA setup for quantitative depth profiling of thin films

Simone Giangrandi, Timo Sajavaara, Bert Brijs et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 2008 · 43 citations

Engineering, Physics, Microscopy +6

Nanopotentiometry: Local potential measurements in complementary metal–oxide–semiconductor transistors using atomic force microscopy

Thomas Trenkler, Peter Wolf, W. Vandervorst et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 38 citations

Atomic Force Microscopy, Cross Section, Local Potential Measurements +19