Mireille Maenhoudt

Pitch doubling through dual-patterning lithography challenges in integration and litho budgets

Mircea Dusa, John Quaedackers, Olaf F. A. Larsen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 87 citations

Wafer Scale Processing, Engineering, Electron-beam Lithography +13

Double patterning scheme for sub-0.25 k1 single damascene structures at NA=0.75, λ=193nm

Mireille Maenhoudt, Janko Versluijs, Herbert Struyf et al. · Optical Microlithography XVIII · 2005 · 52 citations

Minimum Pitch, Electrical Engineering, Double Patterning Scheme +10

Double patterning for 32nm and below: an update

Jo Finders, Mircea Dusa, Bert Vleeming et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 42 citations

Cdu Control, Physical Design (Electronics), Array Computing +15

Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)

Julien Beynet, Patrick Wong, Andy Miller et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 33 citations

Novel aberration monitor for optical lithography

Peter Dirksen, C.A.H. Juffermans, Rudy J. M. Pellens et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 30 citations

Circular Phase Object, Optical Materials, Engineering +19