Novel aberration monitor for optical lithography

Abstract

The aberration monitor allows independent determination of spherical, coma, astigmatism and three point in a single experiment using existing equipment. The monitor consists of a circular phase object, with a diameter of approximately (lambda) /NA and a phase depth of (lambda) /2. Due to the relative large diameter, the image prints as a narrow ring into the resist. Without aberrations its contours are concentric circles. Aberrations deform the ring in a characteristic way. A detailed analysis of the ring shape through focus identifies the aberrations of the projection lens. A linear aberration model is compared with simulations. Experimental results of various aberrations are shown and ar correlated to line width measurements and interferometric lens data.