V. Ontalus

High Performance 45-nm SOI Technology with Enhanced Strain, Porous Low-k BEOL, and Immersion Lithography

P. Agnello, T. Ivers, C. Warm et al. · 2006 · 115 citations

Engineering, Computer Engineering, Electrical Engineering +17

22nm High-performance SOI technology featuring dual-embedded stressors, Epi-Plate High-K deep-trench embedded DRAM and self-aligned Via 15LM BEOL

P. Chang, C. Ortolland, David Fried et al. · 2012 · 89 citations

Engineering, Computer Engineering, Electrical Engineering +17

415/610GHz f_T/f_MAX SiGe HBTs Integrated in a 45nm PDSOI BiCMOS process

Vibhor Jain, John J. Pekarik, Crystal Kenney et al. · 2022 International Electron Devices Meeting (IEDM) · 2022 · 19 citations

Engineering, Electrical Engineering, Microelectronics +16

Ultra-thin Gate Dielectric Plasma Charging Damage in SOI Technology

D. Harmon, Terence B. Hook, V. Ontalus et al. · 2006 · 17 citations

Engineering, Electrical Engineering, Physics +12

SiGe HBTs with ${f_{T}/f_{\max}\,\sim\,375/510GHz}$ Integrated in 45nm PDSOI CMOS

John J. Pekarik, Vibhor Jain, Crystal Kenney et al. · 2021 · 17 citations

Engineering, Electrical Engineering, Microelectronics +13