Statistics
Publications
5
Citations
243
H-Index
5
Active since
2001
Affiliations
Erik Loopstra is an author at ASML (Netherlands) specializing in engineering, optics, and electrical engineering.
Publications per year
2001–2017
5
5
EUV lithography at chipmakers has started: performance validation of ASML's NXE:3100
Christian Wagner, Jose Bacelar, Noreen Harned et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 33 citations
Engineering, Manufacturing Engineering, Computer-integrated Manufacturing +13
Performance results of a new generation of 300-mm lithography systems
Boudewijn Sluijk, Tom Castenmiller, Richard du Croo de Jongh et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2001 · 29 citations
Engineering, Electrical Engineering, Manufacturing Engineering +9
High-NA EUV lithography enabling Moore’s law in the next decade
Jan van Schoot, Kars Troost, Frank Bornebroek et al. · 2017 · 20 citations
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