A. Ajmera

Ultrathin high-K gate stacks for advanced CMOS devices

E. P. Gusev, D. A. Buchanan, E. Cartier et al. · 2002 · 196 citations

Engineering, Electrical Engineering, Materials Science +17

Optimization of the germanium preamorphization conditions for shallow-junction formation

Mehmet C. Öztürk, J. J. Wortman, C. M. Osburn et al. · IEEE Transactions on Electron Devices · 1988 · 117 citations

Engineering, Materials Engineering, Materials Science +17

Elimination of end-of-range and mask edge lateral damage in Ge+ preamorphized, B+ implanted Si

A. Ajmera, G. A. Rozgonyi · Applied Physics Letters · 1986 · 100 citations

Engineering, Materials Engineering, Materials Science +17

High performance and low power transistors integrated in 65nm bulk CMOS technology

Zuying Luo, An Steegen, M. Eller et al. · 2005 · 81 citations

Engineering, Electrical Engineering, Low-power Design +16

Partially-depleted SOI technology for digital logic

G. Shahidi, A. Ajmera, F. Assaderaghi et al. · 2003 · 71 citations

Engineering, Computer Engineering, Electrical Engineering +12