Bruno M. La Fontaine

Author

Advanced Micro Devices (United States)

Also Known As

Bruno M. La Fontaine

Publications

185

Citations

H-Index

Concepts

All Affiliations

Advanced Micro Devices (United States)ASML (Netherlands)ASML (United States)

About

Bruno M. La Fontaine is an author at Advanced Micro Devices (United States) specializing in engineering, optoelectronics, and instrumentation.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	5	5	78
2	Applied Physics	3	3	50
3	Health Sciences	2	2	38
4	Education	1	1	13
5	Medicine	1	1	10

Bruno M. La Fontaine

Publications

135

Citations

H-Index

Page 1

	Year	Citations
Characterization of line-edge roughness in photoresist using an image fading technique Adam R. Pawloski, Alden Acheta, Ivan Lalovic, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2004	57
Rigorous EM simulation of the influence of the structure of mask patterns on EUVL imaging Yunfei Deng, Bruno M. La Fontaine, Harry Levinson, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Image ReconstructionEngineeringElectron-beam LithographyElectromagnetic CompatibilityImage Analysis	2003	23
Laser produced plasma EUV sources for device development and HVM David C. Brandt, Igor V. Fomenkov, Michael J. Lercel, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Electrical EngineeringOptical MaterialsEngineeringCollector MirrorNormal Incidence Collector	2012	17
Flare and its impact on low-k 1 KrF and ArF lithography Bruno M. La Fontaine, Mircea Dusa, Alden Acheta, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyOptical TestingOptical MetrologyCalculated Mtf	2002	15
LPP source system development for HVM David C. Brandt, Igor V. Fomenkov, Alex I. Ershov, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Electrical EngineeringScanner ManufacturersEngineeringLaser-plasma InteractionControl Technology	2011	13
Study of the influence of substrate topography on the focusing performance of advanced lithography scanners Bruno M. La Fontaine, Jan Hauschild, Mircea Dusa, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyMicroscopyAdvanced Lithography ScannersPhase-grating Focus Monitor	2003	10

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