Bruno M. La Fontaine

Characterization of line-edge roughness in photoresist using an image fading technique

Adam R. Pawloski, Alden Acheta, Ivan Lalovic et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 57 citations

Rigorous EM simulation of the influence of the structure of mask patterns on EUVL imaging

Yunfei Deng, Bruno M. La Fontaine, Harry Levinson et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 23 citations

Image Reconstruction, Engineering, Electron-beam Lithography +29

Laser produced plasma EUV sources for device development and HVM

David C. Brandt, Igor V. Fomenkov, Michael J. Lercel et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 17 citations

Electrical Engineering, Optical Materials, Engineering +15

Flare and its impact on low-k 1 KrF and ArF lithography

Bruno M. La Fontaine, Mircea Dusa, Alden Acheta et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2002 · 15 citations

Engineering, Electron-beam Lithography, Optical Testing +20

LPP source system development for HVM

David C. Brandt, Igor V. Fomenkov, Alex I. Ershov et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 13 citations

Electrical Engineering, Scanner Manufacturers, Engineering +14