Masami Ikota

A new defect distribution metrology with a consistent discrete exponential formula and its applications

Hiroki Sato, Masami Ikota, Aritoshi Sugimoto et al. · IEEE Transactions on Semiconductor Manufacturing · 1999 · 50 citations

Engineering, Manufacturing Engineering, Microelectronics +16

The need for LWR metrology standardization: the imec roughness protocol

Alain Moussa, Gian F. Lorusso, Takumichi Sutani et al. · 2018 · 24 citations

Engineering, Materials Engineering, Materials Science +17

Metrology of thin resist for high NA EUVL

Gian F. Lorusso, Christophe Béral, Janusz Bogdanowicz et al. · Metrology, Inspection, and Process Control XXXVI · 2022 · 18 citations

Engineering, Electrical Engineering, Materials Science +13

Enabling CD SEM metrology for 5nm technology node and beyond

Gian F. Lorusso, Takeyoshi Ohashi, Astuko Yamaguchi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 11 citations

Engineering, Electrical Engineering, Manufacturing Engineering +17

Linewidth roughness of advanced semiconductor features using focused ion beam and planar-transmission electron microscope as reference metrology

Kiyoshi Takamasu, Satoru Takahashi, Hiroki Kawada et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2018 · 10 citations

Engineering, Electrical Engineering, Materials Science +17