Christophe Béral

28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV lithography

Danilo De Simone, Luka Ključar, Poulomi Das et al. · 2021 · 25 citations

Exploring the readiness of EUV photo materials for patterning advanced technology nodes

Danilo De Simone, Yannick Vesters, Atif Shehzad et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 19 citations

Short Wavelength Optic, Optical Materials, Engineering +19

Metrology of thin resist for high NA EUVL

Gian F. Lorusso, Christophe Béral, Janusz Bogdanowicz et al. · Metrology, Inspection, and Process Control XXXVI · 2022 · 14 citations

Massive metrology and inspection solution for EUV by area inspection SEM with machine learning technology

Tsuyoshi Kondo, Naoma Ban, Yasushi Ebizuka et al. · Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV · 2021 · 13 citations

Engineering, Machine Learning, Electronic Design Automation +19

Material and process optimization for EUV pattern rectification by DSA

Lander Verstraete, Hyo Seon Suh, Julie Van Bel et al. · 2024 · 11 citations