Switching and memory phenomena in Langmuir–Blodgett films

K Sakai, Hiro Matsuda, Hiroki Kawada, +2

Applied Physics Letters

Memory PhenomenaEngineeringEmerging Memory TechnologyThin Film Process TechnologySemiconductors +14

Characterization of line-edge roughness in resist patterns and estimations of its effect on device performance

Atsuko Yamaguchi, Ryuta Tsuchiya, Hiroshi Fukuda, +3

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringMeasurementEducationLine-edge RoughnessInterconnect (Integrated Circuits) +15

Metrology of LER: influence of line-edge roughness (LER) on transistor performance

Atsuko Yamaguchi, Katsuhiko Ichinose, Satoshi Shimamoto, +5

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Bias-free measurement of LER/LWR with low damage by CD-SEM

Atsuko Yamaguchi, Robert Steffen, Hiroki Kawada, +1

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringMeasurementEducationNoise ReductionElectromagnetic Compatibility +16

Analysis of Line-edge Roughness in Resist Patterns and Its Transferability as Origins of Device Performance Degradation and Variation

Atsuko Yamaguchi, Hiroshi Fukuda, Hiroki Kawada, +1

Journal of Photopolymer Science and Technology

Electrical EngineeringEngineeringResistorDevice Performance DegradationSpecific Resistance +10

Impact of Long-Period Line-Edge Roughness (LER) on Accuracy in Critical Dimension (CD) Measurement and New Guideline for CD Metrology

Atsuko Yamaguchi, Hiroshi Fukuda, Hiroki Kawada, +1

Japanese Journal of Applied Physics

Electrical EngineeringEngineeringCritical DimensionLer ImpactMeasurement +13

Electrical memory switching in Langmuir-Blodgett films

K Sakai, Hiroki Kawada, Osamu Takamatsu, +3

Thin Solid Films

Electrical EngineeringEngineeringElectrical MemoryElectronic MemoryApplied Physics +4

Study of Measurement Condition Optimization in Critical Dimension-Scanning Electron Microscope

Keiichiro Hitomi, Yoshinori Nakayama, Hiromasa Yamanashi, +2

Japanese Journal of Applied Physics

EngineeringElectron-beam LithographyMicroscopyMeasurementEducation +16

Hybrid metrology solution for 1X node technology

Alok Vaid, Alexander Elia, Mark Kelling, +16

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringElectron-beam LithographyMeasurementEducationComputer-aided Design +19

Conducting defects in Langmuir-Blodgett films

Hiro Matsuda, Hiroki Kawada, K. Takimoto, +3

Thin Solid Films

Materials EngineeringMaterials ScienceEngineeringSurface ScienceApplied Physics +4