Novel hexameric tin carboxylate clusters as efficient negative-tone EUV photoresists: high resolution with well-defined patterns under low energy doses

Jia‐Rong Wu, Ting‐An Lin, Yanru Wu, Po-Hsiung Chen, Tsi-Sheng Gau, Po‐Wen Chiu, Rai‐Shung Liu

Nanoscale Advances · 2023 · 31 citations · 28 references

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Abstract

-butyl groups of cluster 1 are prone to cleavage whereas the vinyl-Sn bonds of species 2 are inert toward EUV irradiation; participation of radical polymerization is evident for the latter.

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