Metal–Organic Framework-Inspired Metal-Containing Clusters for High-Resolution Patterning

Abstract

We report the preparation of discrete nanometer-scale zinc-based clusters and use them to form sub-15 nm structures by means of extreme ultraviolet lithography. By taking advantage of a metal-containing building unit derived by a metal–organic framework—MOF-2, we found the 3-methyl-phenyl-modified Zn-mTA cluster that formed is well-defined with controlled size and structure and demonstrates extremely high solubility. Progress in recent years in metal–organic frameworks has created a rich variety of metal-containing structures that are useful for numerous applications. Substitution of the bridging ligands with monovalent ligands produces a discrete metal–organic cluster that strongly interacts with soft X-rays at a wavelength of 13 nm. Here we describe the design, preparation, computational modeling, and physical characterization of these new materials. Such metal-containing structures may form the basis of photoresists that enable the next generation of microelectronic devices.