Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 12 citations · 9 references
EngineeringManufacturing EngineeringMaterials ScienceComputational Materials ScienceDigital FabricationMicrofabricationComputational FabricationDesign For ManufacturingDesign Automation For FabricationDirected Self-assemblyImmersion LithographyInfidelity DetectionMask Error Enhancement FactorMetricsTemplate-directed Self-assembly
In this paper, we present an optimization methodology for the template designs of sub-resolution contacts using directed self-assembly (DSA) with grapho-epitaxy and immersion lithography. We demonstrate the flow using a 60nm-pitch contact design in doublet with Monte Carlo simulations for DSA. We introduce the notion of Template Error Enhancement Factor (TEEF) to gauge the sensitivity of DSA printing infidelity to template printing infidelity, and evaluate optimized template designs with TEEF metrics. Our data shows that SMO is critical to achieve sub-80nm non- L0 pitches for DSA patterns using 193i.
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