Neal Lafferty

Development of an inorganic photoresist for DUV, EUV, and electron beam imaging

Markos Trikeriotis, Woo Jin Bae, Evan L. Schwartz et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 72 citations

Natural Sciences, Materials Engineering, Materials Science +17

Development of an inorganic nanoparticle photoresist for EUV, e-beam, and 193nm lithography

Marie Krysak, Markos Trikeriotis, Evan L. Schwartz et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 64 citations

Natural Sciences, Materials Engineering, Materials Science +17

Evanescent wave imaging in optical lithography

Bruce W. Smith, Yongfa Fan, Jianming Zhou et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 33 citations

Engineering, Materials Science, Microfabrication +15

Progress towards the integration of optical proximity correction and directed self-assembly of block copolymers with graphoepitaxy

Chi‐Chun Liu, Jed W. Pitera, Neal Lafferty et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 28 citations

Engineering, Materials Engineering, Digital Fabrication +12

Computational aspects of optical lithography extension by directed self-assembly

Kafai Lai, Chi‐Chun Liu, Jed W. Pitera et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 26 citations

Engineering, Electrical Engineering, Manufacturing Engineering +14