Bruce W. Smith

A high performance 1.8 V, 0.20 μm CMOS technology with copper metallization

S. Venkatesan, A. V. Gelatos, S. Hisra et al. · 2002 · 101 citations

High Performance 0.20, Engineering, Vlsi Design +19

Development of an inorganic photoresist for DUV, EUV, and electron beam imaging

Markos Trikeriotis, Woo Jin Bae, Evan L. Schwartz et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 65 citations

Engineering, Electron-beam Lithography, Microscopy +21

Development of an inorganic nanoparticle photoresist for EUV, e-beam, and 193nm lithography

Marie Krysak, Markos Trikeriotis, Evan L. Schwartz et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 60 citations

Materials Science, Inorganic Nanoparticle Photoresist, Optical Materials +14

Challenges in high NA, polarization, and photoresists

Bruce W. Smith, Julian S. Cashmore · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2002 · 46 citations

Optical Materials, Engineering, Electron-beam Lithography +17

Evanescent wave imaging in optical lithography

Bruce W. Smith, Yongfa Fan, Jianming Zhou et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 33 citations

Photonics, Engineering, Electron-beam Lithography +15